Published On Jul 8, 2014
The era of atomic scale engineering presents an unprecedented challenge to making the most advanced technology. The creation of state-of-the-art semiconductor devices rely on etch and deposition processes. Explore career opportunities at Lam Research: https://bit.ly/48cqg0g
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Atomic layer etch and deposition help create the most advanced semiconductor structures even with high aspect ratios or 3-dimensional geometries. Multi-step processes happen fast by using plasma and switching between absorption and desorption to fine tune material.